Coating apparatus – Gas or vapor deposition – With treating means
Patent
1984-02-21
1987-02-10
Bueker, Richard
Coating apparatus
Gas or vapor deposition
With treating means
118715, 118733, 118 50, C23C 1308
Patent
active
046416030
ABSTRACT:
An epitaxial growing apparatus comprises a base plate, a quartz bell jar mounted on the base plate, and a reaction chamber defined by the base plate and the quartz bell jar, in which an epitaxial thin film layer of a semiconductor substance is formed on the substrate mounted on a support member. A metal bell jar is disposed outside the quartz bell jar so as to surround the quartz bell jar and a plurality of engaging members are operatively connected to the metal bell jar for detachably engaging the metal bell jar with the quartz bell jar.
REFERENCES:
patent: 4430959 (1984-02-01), Ebata et al.
patent: 4545327 (1985-10-01), Campbell et al.
Goto Taizan
Iwata Kotei
Komiyama Yoshizo
Miyazaki Yoshihiko
Bueker Richard
Toshiba Kikai Kabushiki Kaisha
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