Environmental control apparatus

Details Environmental control apparatus Environmental control apparatus

1993-08-31

1995-05-09

Joyce, Harold

Ventilation

Workstation ventilator

Covered workbench chamber

454187, F24F 316

Patent

active

054135273

ABSTRACT:
A substrate holder containing semiconductor substrates is held in an air-tight container for conveyance which is placed over the entrance of a chamber. The gas drawn by a first fan for circulating gas through the bottom wall of the chamber flows through a first duct for circulating gas so as to be cleaned by a first high-efficiency filter and to be supplied into the chamber again in a horizontal laminar flow. The clean gas is supplied into the chamber in a vertical laminar flow from a second duct for circulating gas which has a second fan for circulating gas and a second high-efficiency filter.

REFERENCES:
patent: 4927438 (1990-05-01), Mears et al.
patent: 4963069 (1990-10-01), Wurst et al.
patent: 5069113 (1991-12-01), Mattson et al.
patent: 5178639 (1993-01-01), Hishi
patent: 5181819 (1993-01-01), Sakata et al.
patent: 5195922 (1993-03-01), Genco
"SMIF: A Technology for Wafer Cassette Transfer in VLSI Manufacturing", Solid State Technology, Jul. 1984, pp. 110-115.
Clean Room Handbook, Japan Air Cleaning Association, pp. 93-97.

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