Stock material or miscellaneous articles – Composite – Of silicon containing
Reexamination Certificate
2006-11-21
2006-11-21
McNeil, Jennifer C. (Department: 1775)
Stock material or miscellaneous articles
Composite
Of silicon containing
C428S688000, C428S689000, C428S701000, C428S702000, C216S036000, C216S036000
Reexamination Certificate
active
07138183
ABSTRACT:
An environmental barrier coating material comprising one or more constituents selected from a group consisting of hafnia; hafnia stabilized by one or more rare-earth oxides and/or silica; zirconia-containing hafnia; and zirconia-containing hafnia stabilized by one or more rare-earth oxides and/or silica, which when formed as a coating structure for covering a substrate which has a low thermal expansion coefficient, has hafnon (HfSiO4) serving as a first layer directly formed on the substrate, and hafnia with which the first layer is coated as a second layer.
REFERENCES:
patent: 3634113 (1972-01-01), Fehrenbacher
patent: 6759151 (2004-07-01), Lee
patent: 6812176 (2004-11-01), Zhu et al.
patent: 7001859 (2006-02-01), Zhu et al.
patent: 5-208870 (1993-08-01), None
patent: 5-221728 (1993-08-01), None
patent: 6-32658 (1994-02-01), None
patent: 10-87364 (1998-04-01), None
patent: 10-87386 (1998-04-01), None
patent: 11-12050 (1999-01-01), None
patent: 11-139883 (1999-05-01), None
Hisamatsu Tooru
Kanzaki Syuzo
Ohji Tatsuki
Ueno Shunkichi
Yuri Isao
Central Research Institute of Electric Power Industry
Ivey Elizabeth D.
McNeil Jennifer C.
National Institute of Advanced Industrial Science and Technology
Notaro & Michalos P.C.
LandOfFree
Environmental barrier coating material and coating structure... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Environmental barrier coating material and coating structure..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Environmental barrier coating material and coating structure... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3671769