Environment friendly methods and systems for template...

Cleaning and liquid contact with solids – Processes – Using sequentially applied treating agents

Reexamination Certificate

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C134S001000, C134S001100, C134S001200, C134S001300, C134S004000, C134S006000, C134S007000, C134S026000

Reexamination Certificate

active

07846266

ABSTRACT:
Cleaning and reclaiming nano-imprint templates using environment friendly methods and systems is disclosed. A template may be cleaned by a combination of exposure to activated gaseous species followed by rinsing with oxygenated or hydrogenated DI water and exposure to reactive plasma to remove organic contaminant. Contaminant may be removed by forming a coating film of a water soluble polymer on the template and then peeling off the coating film. Organic residue from the film may be removed using oxygenated plasma.

REFERENCES:
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patent: 6939435 (2005-09-01), Tanaka et al.
patent: 6973934 (2005-12-01), Tsuga et al.
patent: 2009/0038636 (2009-02-01), Wuister et al.
Gim S. Chen, “The Application of DI-O3 Water on Wafer Surface Preparation” downloaded from the internet on Feb. 7, 2006, downloaded from: <http://www.akrion.com/apex/pdfs/dio3prep.pdf#search=‘Gim%20S.%20Chen’>.
Applied Surfce Technologies “Carbon Dioxide Snow Cleaning” 1996, downloaded from the internet on Feb. 7, 2006, downloaded from <http://www.co2clean.com/cleaners.htm>.
D. Peters et al., “Development of Fluoride-Containing Solvent-Based Strippers” fromFuture Fab International, vol. 14, Issue 20, Feb. 11, 2003.

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