Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Compositions to be polymerized by wave energy wherein said...
Reexamination Certificate
2006-04-11
2006-04-11
Berman, Susan (Department: 1711)
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Compositions to be polymerized by wave energy wherein said...
C522S170000, C522S174000, C528S373000, C528S374000, C528S376000, C568S020000, C568S021000, C568S022000, C568S025000, C568S026000, C568S038000, C568S042000, C568S057000, C568S059000
Reexamination Certificate
active
07026372
ABSTRACT:
A composition containing 3,3′-thiobis(propane-1,2-dithiol) and one or more enic compounds which composition is photocurable and can give a cured product having a high refractive index and adequate hardness.
REFERENCES:
patent: 3625925 (1971-12-01), Oswald et al.
patent: 4609762 (1986-09-01), Morris et al.
patent: 5407972 (1995-04-01), Smith et al.
patent: 5753730 (1998-05-01), Nagata et al.
patent: 5908876 (1999-06-01), Fujii et al.
patent: 5916987 (1999-06-01), Kobayashi et al.
patent: 5969867 (1999-10-01), Fukushima et al.
patent: 6153663 (2000-11-01), Chen et al.
patent: 6184323 (2001-02-01), Jiang
patent: 6313251 (2001-11-01), Toh et al.
patent: 6596841 (2003-07-01), Tanaka et al.
patent: 6872333 (2005-03-01), Ishii et al.
patent: 0 329 387 (1989-08-01), None
patent: 0 394 495 (1990-10-01), None
patent: 01-197528 (1989-08-01), None
Ishii Kenji
Kondo Mitsuteru
Okazaki Hitoshi
Takasuka Masaaki
Takeuchi Motoharu
Berman Susan
Mitsubishi Gas Chemical Company Inc.
Wenderoth , Lind & Ponack, L.L.P.
LandOfFree
Enic compounds, sulfur-containing polyenic compound,... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Enic compounds, sulfur-containing polyenic compound,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Enic compounds, sulfur-containing polyenic compound,... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3576132