Enhancement of coating uniformity by alumina doping

Details Enhancement of coating uniformity by alumina doping Enhancement of coating uniformity by alumina doping

1997-09-26

1999-09-28

Mayekar, Kishor

Chemistry: electrical and wave energy

Processes and products

Electrophoresis or electro-osmosis processes and electrolyte...

204484, 204491, 4273764, 4273768, 427405, 148518, C25D 1302

Patent

active

059582049

ABSTRACT:
A method of controlling the final coating thickness of a diffused aluminide coating on a metal substrate. The method includes: (a) depositing an alumina-doped platinum-silicon powder onto a metal substrate, (b) heating the coated substrate to diffuse the platinum-silicon powder into the substrate and removing the undiffused scale, (c) depositing an aluminum-bearing powder onto the platinum-silicon-enriched substrate, and (d) heating the coated substrate to diffuse the aluminum-bearing powder into the substrate and removing the undiffused scale. The depositions are preferably done electrophoretically, in which case the Pt--Si deposition bath is doped with alumina or some other inert particulate. Alternatively, slurry deposition may be used. The method may also be used to deposit Pd--Si coatings onto metal substrates.

REFERENCES:
patent: 2982707 (1961-05-01), Scheible
patent: 3575838 (1971-04-01), Hughes
patent: 4439470 (1984-03-01), Sievers
patent: 4656099 (1987-04-01), Sievers
patent: 5057196 (1991-10-01), Creech et al.
Smith, J.S. and Boone, D.H., "Platinum Modified Alumindies-Present Status", presented at the Gas Turbine and Aeroengine Congress and Exposition, Jun. 11-14, 1990, Brussels, Belgium.

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