Enhanced vertical thermal reactor system

Coating apparatus – Gas or vapor deposition – Multizone chamber

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

118725, 118728, 118733, 414217, 414416, 414787, 414937, 219390, C23C 1600

Patent

active

052541703

ABSTRACT:
An enhanced vertical thermal reactor system provides three isolated chambers including a wafer handling chamber, a process chamber including an elevator, and a cool-down chamber, each sealed from the other. The sealing of these individual chambers, each from the other, has the effect of minimizing processing delays associated with the cooling process and the loading and unloading process to thereby improve the productivity of the furnace.

REFERENCES:
patent: 3805736 (1974-04-01), Foehring
patent: 4534314 (1985-08-01), Ackley
patent: 4576830 (1986-03-01), Kiss
patent: 4592306 (1986-06-01), Gallego
patent: 4593644 (1986-06-01), Hanak
patent: 4643629 (1987-02-01), Takahashi et al.
patent: 4649830 (1987-03-01), Tanaka
patent: 4717461 (1988-01-01), Strahl
patent: 4770590 (1988-09-01), Hugues
patent: 4825808 (1989-05-01), Takahashi et al.
patent: 4851018 (1989-07-01), Lazzari
patent: 5058526 (1991-10-01), Matsushita

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Enhanced vertical thermal reactor system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Enhanced vertical thermal reactor system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Enhanced vertical thermal reactor system will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1348626

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.