Enhanced vertical thermal reactor system

Details Enhanced vertical thermal reactor system Enhanced vertical thermal reactor system

1989-08-07

1993-10-19

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118725, 118728, 118733, 414217, 414416, 414787, 414937, 219390, C23C 1600

Patent

active

052541703

ABSTRACT:
An enhanced vertical thermal reactor system provides three isolated chambers including a wafer handling chamber, a process chamber including an elevator, and a cool-down chamber, each sealed from the other. The sealing of these individual chambers, each from the other, has the effect of minimizing processing delays associated with the cooling process and the loading and unloading process to thereby improve the productivity of the furnace.

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patent: 4825808 (1989-05-01), Takahashi et al.
patent: 4851018 (1989-07-01), Lazzari
patent: 5058526 (1991-10-01), Matsushita

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