Enhanced vertical thermal reactor system

Details Enhanced vertical thermal reactor system Enhanced vertical thermal reactor system

1991-01-18

1994-08-09

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

219390, 414217, 118725, 118733, C23C 1600

Patent

active

053363256

ABSTRACT:
An enhanced vertical thermal reactor system provides three isolated chambers including a wafer handling chamber, a process chamber including an elevator, and a cool down chamber, each sealed from the other. The sealing of these individual chambers, each from the other, has the effect of minimizing processing delays associated with the cooling process and the loading and unloading process to thereby improve the productivity of the furnace. The process chamber includes non-metallic media such that it can be operated in oxidation systems so that corrosive acids will not affect the process chamber operation.

REFERENCES:
patent: 3805736 (1974-04-01), Foehring
patent: 4576830 (1986-03-01), Kiss
patent: 4593644 (1986-06-01), Hanak
patent: 4640223 (1987-02-01), Dozier
patent: 4767251 (1988-08-01), Whang
patent: 4803948 (1989-02-01), Nakagawa
patent: 4825808 (1989-05-01), Takahashi
patent: 4926793 (1990-05-01), Arima
patent: 4962726 (1990-10-01), Matsushita
patent: 5058526 (1991-10-01), Matsushita

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