Enhanced rapid thermal processing apparatus and method

Details Enhanced rapid thermal processing apparatus and method Enhanced rapid thermal processing apparatus and method

2007-02-27

2007-02-27

Robinson, Daniel (Department: 3742)

Electric resistance heating devices

Heating devices

Radiant heater

C118S724000

Reexamination Certificate

active

11228964

ABSTRACT:
A heating arrangement heats a first major surface of a workpiece with an illumination energy such that a first portion of the illumination energy is directly incident upon the first major surface of the workpiece and a second portion of the illumination energy is directed such that, at least initially, the second portion would miss the first major surface. A reflector, having a central opening, reflects at least some of the second portion of the illumination energy onto the peripheral edge region of the workpiece for preheating compensation. The reflector is configured for shadow-free exposure of a second, opposing major surface of the workpiece to a flash heating energy. A workpiece manipulation arrangement is described to provide for dynamic preheating movement to vary a heating profile across the workpiece and, thereafter, move the workpiece to a flash heating position. Automatic workpiece centering is featured by the manipulation arrangement.

REFERENCES:
patent: 4560420 (1985-12-01), Lord
patent: 4818327 (1989-04-01), Davis et al.
patent: 4857689 (1989-08-01), Lee
patent: 4981815 (1991-01-01), Kakoschke
patent: 5399523 (1995-03-01), Kakoschke
patent: 5467220 (1995-11-01), Xu
patent: 5848889 (1998-12-01), Tietz et al.
patent: 6072163 (2000-06-01), Armstrong et al.
patent: 6188838 (2001-02-01), Mikata et al.
patent: 6222990 (2001-04-01), Guardado et al.
patent: 6303411 (2001-10-01), Camm et al.
patent: 6529686 (2003-03-01), Ramanan et al.
patent: 6594446 (2003-07-01), Camm et al.
patent: 6610968 (2003-08-01), Shajii et al.
patent: 6621199 (2003-09-01), Parfeniuk et al.
patent: 6717158 (2004-04-01), Gat et al.
patent: 6849831 (2005-02-01), Timans et al.
patent: 2002/0102098 (2002-08-01), Camm et al.
patent: 2004/0105670 (2004-06-01), Kusuda et al.
patent: 2004/0178553 (2004-09-01), Camm et al.
patent: 2005/0063453 (2005-03-01), Camm et al.
patent: 2005/0133167 (2005-06-01), Camm et al.
patent: 2005/0179354 (2005-08-01), Camm et al.

Affiliated with

Also associated with

Rating

Enhanced rapid thermal processing apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Enhanced rapid thermal processing apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Enhanced rapid thermal processing apparatus and method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3891845