Enhanced plasma filter

Details Enhanced plasma filter Enhanced plasma filter

2006-11-13

2008-11-04

Van, Quang T (Department: 3742)

Electric heating

Inductive heating

Specific inductor configuration

C219S121360, C219S121590, C156S345280

Reexamination Certificate

active

07446289

ABSTRACT:
A device is provided for adiabatically compressing a plasma stream and maintaining the plasma stream in the compressed state. The device has a plasma compression region; a first plurality of electromagnets positioned around the plasma compression region for compressing the plasma stream; a reaction region positioned down stream from the plasma compression region; and a second plurality of electromagnets positioned around the reaction region for maintaining the plasma stream in its compressed state.

REFERENCES:
patent: 4123316 (1978-10-01), Tsuchimoto
patent: 5288969 (1994-02-01), Wong et al.
patent: 5567268 (1996-10-01), Kadomura
patent: 5585766 (1996-12-01), Shel
patent: 5762750 (1998-06-01), Chen et al.
International Search Report and Written Opinion, International Application No. PCT/US2006/043941, mailed Aug. 6, 2007.

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