Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction
Patent
1994-09-26
1996-10-01
Crane, Sara W.
Active solid-state devices (e.g., transistors, solid-state diode
Thin active physical layer which is
Heterojunction
257 77, 257190, 257212, H01L 2906
Patent
active
055613020
ABSTRACT:
An enhanced mobility MOSFET device (10) comprises a channel layer (12) formed on a monocrystalline silicon layer (11). The channel layer (12) comprises an alloy of silicon and a second material with the second material substitutionally present in silicon lattice sites at an atomic percentage that places the channel layer (12) under a tensile stress.
REFERENCES:
patent: 4994866 (1991-02-01), Awano
patent: 5019882 (1991-05-01), Solomon et al.
patent: 5036374 (1991-07-01), Shimbo
patent: 5055887 (1991-10-01), Yamazaki
patent: 5155571 (1992-10-01), Wang et al.
patent: 5227644 (1993-07-01), Ueno
patent: 5241197 (1993-08-01), Murakami et al.
patent: 5272365 (1993-12-01), Nakagawa
patent: 5360986 (1994-11-01), Candelaria
Demkov et al., "Theoretical investigation of random Si-C alloys", The American Physical Society, vol. 48, No. 4, Jul. 1993, pp. 2207-2214.
Sze, Semiconductor Devices: Physics and Technology, 1985, pp. 328-329.
R. People et al., Band Alignments of coherently strained Ge.sub.X Si.sub.1-x / Si heterostructures on <001> Ge.sub.y Si.sub.1-y Substrates, Appl. Phys. Lett. vol. 48, No. 8, 24 Feb. 1986, pp. 538-540.
Bowers Courtney A.
Crane Sara W.
Jackson Kevin B.
Motorola Inc.
LandOfFree
Enhanced mobility MOSFET device and method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Enhanced mobility MOSFET device and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Enhanced mobility MOSFET device and method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1503520