Enhanced lithographic displacement measurement system

Details Enhanced lithographic displacement measurement system Enhanced lithographic displacement measurement system

2006-01-17

2006-01-17

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S067000

Reexamination Certificate

active

06987557

ABSTRACT:
Measurements of an interferometric measurement system are corrected for variations of atmospheric conditions such as pressure, temperature, and turbulence using measurements from a second harmonic interferometer (SHI). A ramp, representing the dependence of the SHI data on path length, is removed before utilizing the SHI data. The SHI may include a passive Q-switched laser as a light source and Brewster prisms in the receiver module. Optical fibers may be used to conduct light to the detectors. A mirror reflecting the measurement beams has a coating of a thickness selected to minimize the sensitivity of the SHI data to changes in coating thickness.

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patent: 2002/0045113 (2002-04-01), Pril et al.

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