Enhanced diamond polishing

Details Enhanced diamond polishing Enhanced diamond polishing

2007-07-03

2007-07-03

Nguyen, Dung Van (Department: 3723)

Abrading

Abrading process

Combined abrading

C451S041000

Reexamination Certificate

active

11326242

ABSTRACT:
A grown single crystal diamond is polished using a non contact polishing technique, which leaves a residue on the diamond surface. In one embodiment, a wet chemical etch is performed to remove the residue, leaving a highly polished single crystal diamond surface. In a further embodiment, a colloidal silica solution is used in combination with rotating polishing pads to remove the residue. Both residue removing techniques may be used in further embodiments.

REFERENCES:
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patent: 5746931 (1998-05-01), Graebner et al.
patent: 6276997 (2001-08-01), Li
patent: 6319095 (2001-11-01), Merchant et al.
patent: 2006/0102854 (2006-05-01), Neogi et al.
patent: WO-06047611 (2006-05-01), None

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