Enhanced alumina layer produced by CVD

Details Enhanced alumina layer produced by CVD Enhanced alumina layer produced by CVD

2008-07-08

2008-07-08

Turner, Archene (Department: 1794)

Stock material or miscellaneous articles

Structurally defined web or sheet

Including components having same physical characteristic in...

C051S307000, C051S309000, C428S325000, C428S336000, C428S698000, C428S699000, C428S701000, C428S702000

Reexamination Certificate

active

07396581

ABSTRACT:
The present invention introduces a new and refined method to produce α-Al2O3layers with substantially better wear resistance and toughness than the prior art. The α-Al2O3layer of the present invention is formed on a bonding layer of (Ti,Al)(C,O,N) with increasing aluminium content towards the outer surface. Nucleation of α-Al2O3is obtained through a nucleation step being composed of both aluminising and oxidisation steps. The α-Al2O3layer according to this invention has a thickness ranging from 1 to 20 μm and is composed of columnar grains. The length/width ratio of the alumina grains is from 2 to 12, preferably 5 to 9. The layer is characterised by a strong (012) growth texture, measured using XRD, and by the almost total absence (104), (110), (113) and (116) diffraction peaks.

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