Energy efficient method for growing polycrystalline silicon

Single-crystal – oriented-crystal – and epitaxy growth processes; – Processes of growth from liquid or supercritical state – Havin growth from molten state

Reexamination Certificate

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C117S084000, C117S087000, C117S921000

Reexamination Certificate

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07105053

ABSTRACT:
Polysilicon dendrites are grown by depositing silicon on a polysilicon rod or other substrate. Surface temperature is increased to a temperature at which needle-like dendrites develop due to the deposition of silicon from silicon-containing molecules in the surrounding reactor atmosphere. Thereafter, the surface temperature is gradually reduced so that silicon that deposits on the needle-like dendrites causes the dendrites to grow and assume a generally flared shape.

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patent: RE36936 (2000-10-01), Keck et al.
patent: 6365225 (2002-04-01), Chandra et al.
patent: 6503563 (2003-01-01), Yatsurugi et al.

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