Radiant energy – Ionic separation or analysis – With sample supply means
Patent
1994-12-09
1996-04-02
Berman, Jack I.
Radiant energy
Ionic separation or analysis
With sample supply means
250281, 250282, H01J 4900
Patent
active
055043283
ABSTRACT:
An apparatus and method for detecting the endpoint of an etch during semiconductor fabrication is provided. The endpoint detection system utilizes a mass spectrometer having an energy source located outside the vacuum chamber of the endpoint detection system, thus providing an easily replaceable energy source. The energy source may be a light source to provide photo-ionization. The energy source may be selected based upon the gas species of the etch of which an endpoint as being detected. The energy is directed into an ionization chamber of the endpoint detection system through a transparent window.
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Berman Jack I.
Nguyen Kiet T.
Sematech Inc.
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