Endpoint detection system

Details Endpoint detection system Endpoint detection system

1997-05-28

1999-11-16

Breneman, Bruce

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118712, C23F 102, C23C 1600

Patent

active

059850922

ABSTRACT:
A metal etching system has an etching chamber defined by quartz walls. Coils provided around the quartz walls of the etching chamber are used to apply a high frequency electrical field to at least a portion of the etching chamber. Containment walls are provided around the coils. An endpoint detection system is provided for the etching system which includes an optical fiber which extends through the containment wall and the coils, with an end of the optical fiber disposed in fixed relationship to the quartz walls of the etching chamber. A fixture mounts the optical fiber in the containment wall. An air-tight seal, such as an O-ring compressed around the optical fiber and compressed against the containment wall, is provided to limit air flow along the optical fiber to the surface of the etching chamber walls. The O-ring or similar air-tight seal prevents air from flowing from outside of the containment wall to the surface of the etching chamber wall which would otherwise locally cool the etching chamber walls and cause material to deposit onto the chamber walls.

REFERENCES:
patent: 4883560 (1989-11-01), Ishihara
patent: 5290383 (1994-03-01), Koshimizu
patent: 5320704 (1994-06-01), Horioka et al.
patent: 5626714 (1997-05-01), Miyazaki et al.
patent: 5630949 (1997-05-01), Lakin
patent: 5897378 (1999-04-01), Eriguchi

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