End surface-protected frame-supported pellicle for photolithogra

Details End surface-protected frame-supported pellicle for photolithogra End surface-protected frame-supported pellicle for photolithogra

1995-09-07

1997-08-12

Thomas, Alexander

Stock material or miscellaneous articles

Display in frame or transparent casing; or diorama including...

Peripheral enclosure or frame

428 401, 428192, 427560, 427284, G03K 900

Patent

active

056563426

ABSTRACT:
An improvement is proposed for a frame-supported pellicle used for dust-proof protection of a photomask in the photolithographic patterning work in the manufacture of semiconductor devices. In view of the problem that, when a frame-supported pellicle having the other end surface of the frame coated with a pressure-sensitive adhesive and temporarily protected by attaching a releasable protective sheet of a plastic resin prepared by die punching is handled or transported as packaged, subsequent occurrence of dust particles is more or less unavoidable from the rugged die-punched sections, the die-punched peripheries of the protective sheet is subjected to a smoothening treatment by locally dissolving with an organic solvent, by locally melting at a temperature higher than the melting point of the plastic resin or by coating with a coating composition so that the protective sheet is absolutely not responsible for the subsequent formation of dust particles.

REFERENCES:
patent: 5271803 (1993-12-01), Yen
patent: 5327808 (1994-07-01), Nagata et al.
8347 Materials Science and Engineering B, vol. B04, Nos. 1/04; 1 Oct. 1989, pp. 1-10, XP000095483; Werner Zulehner; "Status and Future of Silicon Crystal Growth".

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