End station for an ion implantation apparatus

Details End station for an ion implantation apparatus End station for an ion implantation apparatus

1986-01-16

1988-07-26

Werner, Frank E.

Material or article handling

Device for emptying portable receptacle

With jarring means

414404, 414278, 414331, 414222, 414416, 414744B, 118500, 118730, B65G 4724

Patent

active

047596813

ABSTRACT:
An end station for ion implantation apparatus comprising an ion implantation process unit having a wafer holder and capable of implanting ions in wafers in a high vacuum, and a wafer supply-collection unit for the process unit. The wafer supply-collection unit comprises:

REFERENCES:
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patent: 3921788 (1975-11-01), Robertson, Jr. et al.
patent: 4178113 (1979-12-01), Beaver II et al.
patent: 4293249 (1981-10-01), Whelan
patent: 4336438 (1982-06-01), Uehava et al.
patent: 4378189 (1983-03-01), Takeshita et al.
patent: 4388034 (1983-06-01), Takahashi
patent: 4483651 (1984-11-01), Nakane et al.
patent: 4529353 (1985-07-01), Dean et al.

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