End-point detector for plasma etcher

Details End-point detector for plasma etcher End-point detector for plasma etcher

1998-06-12

2000-07-11

Kim, Robert H.

Optics: measuring and testing

By dispersed light spectroscopy

With sample excitation

356310, 356303, G01J 304

Patent

active

060880961

ABSTRACT:
An end-point detector for a plasma etcher, includes a converging lens for receiving strip-like plasma light produced between a pair of opposed electrodes and a spectroscope, having a slit located at a substantial rear-side focal plane of the converging lens, for detecting an etching end time point from a time-based variation of spectrum light intensity of the plasma light which has been converged at the slit and has passed through the slit. The converging lens has a pupil diameter of not greater than ##EQU1## where W is a width of a short side of the strip-like plasma light produced between the electrodes, 1 is a distance between an end of each electrode and a pupil face of the converging lens, NAm is a numerical aperture required by the spectroscope, and h is a width of a short side of the slit of the spectroscope. The converging lens has a numerical aperture of not less than NAm.

REFERENCES:
patent: 5626714 (1997-05-01), Miyazaki et al.
patent: 5728253 (1998-03-01), Saito et al.

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