End point control in plasma etching

Details End point control in plasma etching End point control in plasma etching

1983-01-07

1985-07-09

Paschall, M. H.

Electric heating

Metal heating

By arc

219121PG, 156646, 156345, 204192E, B23K 900, C23C 1500

Patent

active

045284385

ABSTRACT:
The end point in plasma etching is detected by monitoring the optical emission from the plasma, selecting a particular optical emission line and detecting a substantial variation in the intensity of the emission. This indicates a change in material being etched and thus the completion of etching of one material, or the beginning of etching of another material. It is also applicable to removing, or etching, photoresist material.

REFERENCES:
patent: 3664942 (1972-05-01), Havas et al.
patent: 3809479 (1974-05-01), Whelan et al.
patent: 3966577 (1976-06-01), Hochberg
patent: 4028155 (1977-06-01), Jacob
patent: 4491499 (1985-01-01), Jerde et al.

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