End-Hall ion source

Details End-Hall ion source End-Hall ion source

1986-10-20

1989-08-29

Moore, David K.

Electric lamp and discharge devices

With positive or negative ion acceleration

60202, 250427, 313230, 31323131, 313161, 31511141, 31511161, 31511181, F03H 500

Patent

active

048620327

ABSTRACT:
A gas, ionizable to produce a plasma, is introduced into a region defined within an ion source. An anode is disposed near one end of that region, and a cathode is located near the other. A potential is impressed between the anode and the cathode to produce electrons which flow generally in a direction from the cathode toward the anode and bombard the gas to create a plasma. A magnetic field is established within the region in a manner such that the field strength decreases in the direction from the anode to the cathode. The direction of the field is generally between the anode and the cathode. The electrons are produced independently of any ion bombardment of the cathode, the magnet is located outside the region on the other side of the anode and the gas is introduced uniformly across the region.

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Vossen et al., "Thin Film Processes," Academic Press, 1978.
Morosov, "Physical Principles of Cosmic Jet Propulsion", Atomizdat, vol. 1, Moscow 1978, pp. 13-15.
4th All-Union Conference on Plasma Accelerators and ion Injectors, Notes, Moscow, 1978.
3rd All-Union Conference on Plasma Accelerators, Notes, Minsk, 1976.
Seikel et al, "Plasmas and Magnetic Fields in Propulsion and Power Research," NASA SP-226, Oct. 16, 1969, pp. 1-64.
Moeckel, "Proceedings of the NASA-University Conference on the Science and Technology of Space Exploration," NASA SP-11, Nov. 1962, pp. 153-181.
Kaufman et al, "Ion Source Design for Industrial Applications," AIAA Journal, vol. 20, No. 6, Jun. 1982, pp. 745-760.

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