Thermal measuring and testing – Temperature measurement – In spaced noncontact relationship to specimen
Patent
1989-06-12
1991-02-05
Yasich, Daniel M.
Thermal measuring and testing
Temperature measurement
In spaced noncontact relationship to specimen
324158F, 357 29, 374 57, 392407, G01J 512, G01N 2500
Patent
active
049899910
ABSTRACT:
An improved method and apparatus are disclosed for calibrating the emissivity characteristics of a semiconductor wafer within a processing chamber by supporting a sample wafer on a graphite susceptor within the chamber and by comparing the temperature measured within the susceptor in close proximity to the center of the wafer with the temperature measured by the emission of radiation from the surface of the wafer through the walls of the processing chamber. Temperature measurements subsequently made from the radiation emitted from the surface of similar wafers are corrected with reference to the measurement made of the temperature within the susceptor on the sample wafer.
REFERENCES:
patent: 3277715 (1966-10-01), Vanderschmidt
patent: 3842346 (1974-10-01), Bobbitt
patent: 4503335 (1985-03-01), Takahashi
patent: 4746857 (1988-05-01), Sakai et al.
Nulman Jaim
Pecot Michel
AG Processing Technologies, Inc.
Smith A. C.
Yasich Daniel M.
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