Embossed mask lithography

Details Embossed mask lithography Embossed mask lithography

2007-12-04

2007-12-04

Malsawma, Lex (Department: 2823)

Active solid-state devices (e.g., transistors, solid-state diode

Integrated circuit structure with electrically isolated...

C257SE27026, C365S174000

Reexamination Certificate

active

10885842

ABSTRACT:
Disclosed are layered groupings and methods for constructing digital circuitry, such as memory known as Permanent Inexpensive Rugged Memory (PIRM) cross point arrays which can be produced on flexible substrates by patterning and curing through the use of a transparent embossing tool.

REFERENCES:
patent: 6646912 (2003-11-01), Hurst et al.
patent: 2002/0184459 (2002-12-01), Taussig et al.
patent: 2002/0192895 (2002-12-01), Taussig et al.
patent: 2004/0053497 (2004-03-01), Perlov et al.

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