Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1995-12-15
1997-04-08
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430322, 430324, G03F 900
Patent
active
056186436
ABSTRACT:
A method and apparatus for fabricating a mask for use in patterning a radiation sensitive layer in a lithographic printer. An embedded phase shifting layer is disposed over a substantially transparent base layer such that attenuated regions of the mask are phase shifted approximately 160 to 200 degrees relative to open features in the mask. In accordance with the present invention, radiation transmission is reduced through the open feature regions of the mask. In one embodiment, a thin radiation transmission reducing layer is deposited over the open feature regions of the mask. In another embodiment, the open feature regions of the mask are roughened to reduce radiation transmission. In yet another embodiment, ion implantation is performed in the open feature regions of the mask to reduce transmission. With the reduced transmission of radiation through the open feature regions of the present mask, high resolution lithography employing short wavelength radiation is realized.
REFERENCES:
patent: 5354632 (1992-04-01), Dao et al.
patent: 5415953 (1994-02-01), Alpay et al.
patent: 5480747 (1994-11-01), Vasudev
"The Attenuated Phase Shifting Mask," Solid State Technology, pp. 43-47, Jan. 1992.
Dao Giang T.
Liu Gang
Intel Corporation
Rosasco S.
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