Optics: measuring and testing – By polarized light examination
Patent
1996-05-29
1997-08-26
Font, Frank G.
Optics: measuring and testing
By polarized light examination
356366, 356367, 250225, G01J 400
Patent
active
056615604
ABSTRACT:
In a photomask inspecting method, a photomask is inspected on the basis of the difference between the polarized state of elliptical light produced upon superposition of two linearly polarized light beams having orthogonal polarization directions and passing through two different optical paths and the polarized state of elliptical light produced when two linearly polarized light beams are superposed on each other after a target portion of a photomask is set in the optical path of one of the linearly polarized light beams. A photomask inspecting apparatus is also disclosed.
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Emi Tamechika et al. "Investigation of Single Sideband Optical Lithography (SSBL) Using Oblique Incidence Illumination", EIPB 1992 Orlando, The 36th Int'l Symposium on Electron, Ion and Photon Beams / May 26-29, 1992, 3 pages.
Takahiro Ode, "Improvement of Phase Measurements in Phase-Shift Masks with a Differential Heterodyne Interferometer", PhotoMask Japan, Digest of Papers Photomask Japan 1994, Symposium on Photomask and X-Ray Mask Technology, Apr. 22, 1994, Kanagawa Science Park Kanagawa, Japan, 3 pages.
Matsuura et al. "Measurement of optical phase difference using a polarization technique" Optics and Laser Technology, Dec. 1977, vol. 9, No. 2, pp. 285-289.
Eisenberg Jason D. Vierra
Font Frank G.
Nippon Telegraph and Telephone Public Corporation
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