Elliptical ion beam distribution method and apparatus

Details Elliptical ion beam distribution method and apparatus Elliptical ion beam distribution method and apparatus

1989-11-13

1991-06-25

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

2504923, 250423R, 250427, 31511181, 313230, 3133631, H01J 37317

Patent

active

050269976

ABSTRACT:
An ion source for creating an ion beam. The source includes an ionization chamber having one wall that defines a generally elliptical opening for allowing ions to exit the ionization chamber. Use of an elliptical (in section) ion beam has advantages over a rectangular ion beam which allow the integrity of a relatively high current ion beam to be maintained as ions travel to a beam treatment workstation. A dual configuration extraction electrode assembly also provides for a range of extraction energies from a single source.

REFERENCES:
patent: 2700107 (1955-01-01), Luce
patent: 4831270 (1989-05-01), Weisenberger

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