Ellipsometer/polarimeter based process monitor and control syste

Details Ellipsometer/polarimeter based process monitor and control syste Ellipsometer/polarimeter based process monitor and control syste

1994-10-21

1996-12-10

Bueker, Richard

Coating apparatus

Condition responsive control

118712, 437 7, 437 8, 117 85, C23C 1424, C23C 1454

Patent

active

055826466

ABSTRACT:
A method of, and system for, applying light beam producing systems such as ellipsometers, polarimeters, polarized light reflectance and functionally similar systems, such that a beam of light produced thereby is caused to be incident upon a process element at an angle in excess of an associated Brewster angle while enabling the production of a signal sufficiently sensitive to changes in process element parameters, for use in "real-time" process element process monitoring and control, is disclosed. In addition a process element processing system and electron beam producing system and light beam producing system combination system is taught, wherein the electron beam producing and light beam producing systems are mounted to the process element processing system, (typically a (MBE) system), by input and output interface systems present at a location appropriate for conventional Reflection High Energy Electron Diffraction (RHEED) systems.

REFERENCES:
patent: 4770895 (1988-09-01), Hartley
patent: 5096533 (1992-03-01), Igarashi
patent: 5232547 (1993-08-01), Drowley et al.
patent: 5399521 (1995-03-01), Celli et al.
patent: 5463977 (1995-11-01), Manada et al.
Ellipsometry & Polarized light, Azzam & Bashara, North-Holland 1977 (exerpts included).
Variable Angle of Incidence Spectroscopic Ellipsometry: Application To GaAs-Al.sub.x Ga.sub.1-x As Multiple Hetrostructures, J. App. Physics vol. 60(9), Nov. 1986 by Snyder et al.
Encyclopedia of Materials Characterization, Editors Brundle, Evans Jr., Wilson, Articles on RHEED & LEED included ( REED Publushing 1992).

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