Electrolysis: processes – compositions used therein – and methods – Electrolytic erosion of a workpiece for shape or surface... – Using mask
Patent
1995-01-03
1996-10-22
Phasge, Arun S.
Electrolysis: processes, compositions used therein, and methods
Electrolytic erosion of a workpiece for shape or surface...
Using mask
205667, B23H 302, B23H 718, B23H 906
Patent
active
055673040
ABSTRACT:
In through-mask electroetching of a metal film on top of an insulating substrate, the shape of the metal film being etched is a function of the mask opening, the spacing between the openings and the thickness of the mask. An analysis of the electric field around the mask and the metal film is used to determine conditions leading to the formation of islands of unetched metal films within the openings. The analysis is then used to design the mask pattern and eliminate these islands. The increase in the ratio of the mask thickness to the opening width for eliminating the islands also lowers the undercutting of the mask. Premature stoppage of the electroetching process arising from the isolation of the sample film from the contact is also addressed. The electrical contact to the sample is made at one end and a nozzle jet of electrolyte is slowly swept from the far end of the sample towards the electrical contact. The nozzle speed is matched with the metal removal rate and the electrical contact is exposed to the electrolyte at the end of the process.
REFERENCES:
patent: 3616349 (1968-07-01), Szupillo
patent: 4135989 (1979-01-01), Pruett
patent: 4629539 (1986-12-01), Imai
patent: 4636285 (1987-01-01), Tarumoto et al.
patent: 4642168 (1987-02-01), Imai
patent: 4729940 (1988-03-01), Nee et al.
patent: 5284554 (1994-02-01), Datta et al.
J. P. Hoare, et al., "Electrochemical Machining, " Scientific American, Jan. 1974, p. 30.
D. M. Allen, "The Principles and Practice of Photochemical Machining and Photoetching", various pages (no date).
R. C. Alkire et al., "Effect of Fluid Flow on Removal of Dissolution Products from Small Cavities", J. Electrochem. Soc., Dec. 1994, pp. 2795-2800.
E. Rosset, et al., "Electrochemical disolution of stainless steels in flow channel cells with and without photoresist masks", J. Applied Electrochemisty, 20, pp. 69-76, 1990 *no month.
H. K. Kuiken, "Etching: a two-dimensional mathematical approach", Prot R. Soc. Lond., A392, p. 199, 1984 (no month).
C. Vuik, "Numerical Solution of an Etching Problem", Journal of Computational Physics, 59, pp. 247-249, 262, 263, 1985 (no month).
J. M. West, "Electrodeposition and Corrosion Process", Dept. of Metallurgy, Univ. of Sheffield, pp. 108-109, 118-119, 132-133 (no date).
DeBarr & Oliver, "Electrochemical Machining", pp. 114-115, 102-107, 154-163, and 166-175 (no date).
Rosset et al. "Electrochemical dissolution of stainless steels in flow channel cells with and without photoresist masks" (1990) pp. 69-75. (no month).
Datta Madhav
Romankiw Lubomyr T.
Shenoy Ravindra V.
IBM Corporation
Phasge Arun S,.
LandOfFree
Elimination of island formation and contact resistance problems does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Elimination of island formation and contact resistance problems , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Elimination of island formation and contact resistance problems will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2355823