Coating apparatus – Gas or vapor deposition – Work support
Patent
1988-08-22
1990-02-20
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Work support
118500, 118726, 156613, 156614, 156DIG82, 4272552, C23C 1600
Patent
active
049016709
ABSTRACT:
Apparatus and method for supplying elemental mercury to a MOCVD reactor during the operation of the reactor and for maintaining a saturated mercury vapor atmosphere over a surface of a substrate. A susceptor assembly 10 includes a susceptor 20 having a surface for supporting a substrate 22 within a growth chamber. A reservoir 34 of liquid mercury 36 is disposed external to the reactor and supplies liquid mercury via a capillary feed tube 30 to a depression or trough 24 formed within a surface of the susceptor at an upstream position from the substrate. Mercury within the trough is vaporized by the heated susceptor and flows over the substrate, thereby establishing a saturated mercury atmoshere over the substrate. The reservoir may be pressurized by a source of gas or its vertical position may be adjusted to provide a gravity feed of the mercury.
REFERENCES:
patent: 3471324 (1969-10-01), Wilson et al.
patent: 3594242 (1971-07-01), Burd et al.
patent: 4137108 (1979-01-01), Ihara et al.
patent: 4144116 (1979-03-01), Jacob et al.
patent: 4801557 (1989-01-01), Wessels et al.
Bueker Richard
Denson-Low W. K.
Owens Terry J.
Santa Barbara Research Center
Schubert W. C.
LandOfFree
Elemental mercury source for metal-organic chemical vapor deposi does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Elemental mercury source for metal-organic chemical vapor deposi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Elemental mercury source for metal-organic chemical vapor deposi will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1608669