Elemental mercury source for metal-organic chemical vapor deposi

Details Elemental mercury source for metal-organic chemical vapor deposi Elemental mercury source for metal-organic chemical vapor deposi

1989-11-09

1991-01-15

Morgenstern, Norman

Coating processes

Coating by vapor, gas, or smoke

118500, 118725, 118726, 118728, 156613, 156614, 156DIG82, 427250, 4272552, C23C 1600

Patent

active

049852817

ABSTRACT:
Apparatus and method for supplying elemental mercury to a MOCVD reactor during the operation of the reactor and for maintaining a saturated mercury vapor atmosphere over a surface of a substrate. A susceptor assembly 10 includes a susceptor 20 having a surface for supporting a substrate 22 within a growth chamber. A reservoir 34 of liquid mercury 36 is disposed external to the reactor and supplies liquid mercury via a capillary feed tube 30 to a depression or trough 24 formed within a surface of the susceptor at an upstream position from the substrate. Mercury within the trough is vaporized by the heated susceptor and flows over the substrate, thereby establishing a saturated mercury atmosphere over the substrate. The reservoir may be pressurized by a source of gas or its vertical position may be adjusted to provide a gravity feed of the mercury.

REFERENCES:
patent: 4144116 (1979-03-01), Jacob et al.
patent: 4172756 (1979-10-01), Hollan
patent: 4645689 (1987-02-01), Cox
patent: 4716130 (1987-12-01), Johnston, Jr. et al.
patent: 4808551 (1989-02-01), Mori et al.
Marinace, J. C., "Extremely Thin Epitaxial Germanium Layers on Gallium Arsenide", IBM Technical Disclosure Bulletin, vol. 5, No. 8 (Jan. 1983), p. 85.

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