Element having microstructure and manufacturing method thereof

Details Element having microstructure and manufacturing method thereof Element having microstructure and manufacturing method thereof

2008-03-25

2008-03-25

Sarkar, Asok Kumar (Department: 2891)

Active solid-state devices (e.g., transistors, solid-state diode

Responsive to non-electrical signal

Electromagnetic or particle radiation

C359S569000

Reexamination Certificate

active

07348650

ABSTRACT:
A method of manufacturing an element having a microstructure of an excellent grating groove pattern or the like is obtained. This method of manufacturing an element having a microstructure comprises steps of forming a metal layer on a substrate, forming a dot column of concave portions on the surface of the metal layer and anodically oxidizing the surface of the metal layer formed with the dot column of concave portions while opposing this surface to a cathode surface thereby forming a metal oxide film having a grating groove pattern. When the interval between the concave portions of the dot column is reduced, therefore, a linear grating groove pattern having a large depth with a uniform groove width along the depth direction is easily formed in a self-organized manner.

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Foreign Office Action: Application No.: 03108341.2, Applicant: Sanyo Electric Co., LTD., Dispatch Date: Jan. 13, 2006, Application Date: Mar. 25, 2003, Title: Element Having Microstructure and Manufacturing Method Thereof.
Japanese Office Action Issued in Corresponding Japanese Patent Application No. 2003-073664, dated on Apr. 24, 2007.
Japanese Office Action, with English Translation, issued in corresponding Japanese Patent Application No. 2003-073664, dated on Jul. 25, 2007.

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