Element containing solvent-resistant polymer beads

Details Element containing solvent-resistant polymer beads Element containing solvent-resistant polymer beads

1991-07-16

1993-10-12

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Identified backing or protective layer containing

430527, 430536, 430950, 428480, 428483, 428913, 525191, G03C 185

Patent

active

052524450

ABSTRACT:
Method of preparing solvent-resistant polymer beads sizing 0.5-5 pm and having a glass transition temperature of at least 40.degree. C. by dissolving in a solvent mixture of water and water-miscible polar organic solvent an Alpha, Beta-ethylenically unsaturated monomer (1) capable of forming a polymer that is soluble in the monomer(s) present in said solvent mixture but which is insoluble in said solvent mixture, a monomer (2) carrying COOH group(s), a monomer (3) carrying halogen atom(s), a free radical-forming polymerization initiator, and a graft-polymerizable polymer containing hydrophilic groups, heating the solution obtained to a temperature from 50.degree. C. to the reflux temperature thereof with stirring to form said beads, converting said COOH group(s) by reaction with a hydroxide into a carboxylic acid salt group, and causing said carboxylic acid salt group to react with said halogen atom to form ester cross-linkages. The beads can be used as spacing agents in a sheet or web material.

REFERENCES:
patent: 4022622 (1977-05-01), Timmerman et al.
patent: 4301240 (1981-11-01), Bruck et al.
patent: 4614708 (1986-09-01), Timmerman et al.
patent: 4677050 (1987-06-01), Yokoyama et al.
patent: 4828927 (1989-05-01), Timmerman et al.
patent: 5096975 (1992-03-01), Anderson et al.
patent: 5104779 (1992-04-01), Saverin et al.
patent: 5713396 (1992-12-01), Nagasaki et al.

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