Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1991-11-26
1993-10-26
Niebling, John
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
204186, B03C 502, C02F 146
Patent
active
052562700
ABSTRACT:
An electrostatic separating aparatus comprises a tank which contains an insulating solvent solution and has a feed inlet for the liquid to be treated at the bottom, and a pair of electrodes which is equipped in the solvent solution and between which a high direct current voltage is applied. The side wall of the tank is made to be a double wall to form a pocket between the inner wall and the outer wall, and the upper edge of the inner wall is formed above the upper surface of the solvent solution to overflow the floated impurities of an intermediate layer formed on the upper surface of the solvent solution from the upper edge of the inner wall to the pocket. The pair of electrodes is present one-sided in the tank inclined upward against horizontal plane at an angle of 25.degree. to 40.degree.. A main pocket is provided on the side wall of the tank at the side of the upper edge of the electrode. A porous rectifying plate is provided substantially horizontally above the electrodes but below the upper end of the inner wall constituting the main pocket. A blind baffle plate is provided inclined upward from the center of the tank to the upper part of said main pocket above said porous rectifying plate, and a porous plate is equipped substantially vertically to the upper part of said blind baffle plate. A discharge outlet of treated water is provided on the upper part of the opposite wall of the tank to the main pocket. A water rectifier is provided over the feed inlet for the liquid to be treated. A pipe for automatic discharge of the solvent is further equipped to the tank so that the solvent suction opening is placed lower than the horizontal position of the water rectifier in the tank to enable efficient removal of the solvent in almost pure condition.
REFERENCES:
patent: 3412003 (1968-11-01), Tokumoto
patent: 3891537 (1975-06-01), Tokumoto
patent: 4252631 (1981-02-01), Houarongkura et al.
Leader William T.
Niebling John
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