Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Patent
1987-06-11
1988-05-17
Pal, Asok
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
15 15R, 2091271, B08B 312
Patent
active
047448334
ABSTRACT:
An apparatus and method for electrostatic removal of micron and sub-micron sized contaminant particles is disclosed herein. The apparatus and method comprise creating a potential difference with a megavolt/cm electrostatic field between two conducting bases in a predetermined geometrical relation to each other. An insulator (e.g. a dielectric film) is maintained at or near contact between one of the bases and the surface to be cleaned to electrostatically remove particles from said surface. The bases can be made to move relative to each other and the surface to be cleaned.
REFERENCES:
patent: 2359476 (1944-10-01), Gravley
patent: 2920987 (1960-01-01), Landry et al.
patent: 3245835 (1966-04-01), Gallino
Young et al., IBM Technical Disclosure Bull., vol. 7(3) Aug. 1964, p. 181
Sachar, IBM Technical Disclosure Bull., vol. 18(5) Oct. 1975, pp. 1619-1621.
Cooper Douglas W.
Wolfe Henry L.
Yeh James T. C.
Feig Philip J.
International Business Machines - Corporation
Pal Asok
Tognino Alexander
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