Electrostatic protection device

Details Electrostatic protection device Electrostatic protection device

2005-04-21

2008-11-25

Sefer, A. (Department: 2826)

Active solid-state devices (e.g., transistors, solid-state diode

Regenerative type switching device

Device protection

C257SE29217

Reexamination Certificate

active

07456440

ABSTRACT:
The electrostatic protection device comprises a semiconductor substrate of a first conductivity type, a well of a second conductivity type formed on the semiconductor substrate, a first diffusion layer of the first conductivity type formed on the second conductivity type well and connected to a signal terminal, a first well of the first conductivity type formed on the semiconductor substrate, a first diffusion layer of the second conductivity type formed on the first well and connected to a ground terminal, a second well of the first conductivity type formed on the semiconductor substrate and spaced apart from the first well and a second diffusion layer of the first conductivity type formed on the second well connected to a ground terminal.

REFERENCES:
patent: 4454648 (1984-06-01), Hsia
patent: 6281554 (2001-08-01), Pan
patent: 6713818 (2004-03-01), Kodama
patent: 6806160 (2004-10-01), Ker et al.
patent: 2002/0079538 (2002-06-01), Su et al.
patent: 9-191082 (1997-07-01), None
patent: 11-274404 (1999-10-01), None
patent: 2000-188389 (2000-07-01), None
patent: 2001-144191 (2001-05-01), None
Japanese Office Action dated Mar. 25, 2008, with English translation.
Japanese Office Action dated Jun. 17, 2008, with partial English translation.

Affiliated with

Also associated with

Rating

Electrostatic protection device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electrostatic protection device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrostatic protection device will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4034731