Electrostatic pellicle system for a mask

Details Electrostatic pellicle system for a mask Electrostatic pellicle system for a mask

2005-07-26

2005-07-26

Huff, Mark F. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C428S014000, C355S075000

Reexamination Certificate

active

06921613

ABSTRACT:
The present invention describes an apparatus comprising a mask; a pellicle spacer, the pellicle spacer attached to the mask; and an electrostatic pellicle system, the electrostatic pellicle system attached to the pellicle spacer.The present invention further describes a method of keeping contaminants away from a vicinity of a mask during exposure, the contaminants including an uncharged or neutral particle, a positively-charged particle, or a negatively-charged particle, comprising: inducing a positive or negative charge on the uncharged or neutral particle; attracting the positively-charged particle with a negatively-charged electric field; and attracting the negatively-charged particle with a positively-charged electric field.

REFERENCES:
patent: 6492067 (2002-12-01), Klebanoff et al.
patent: 6569576 (2003-05-01), Hsuch et al.
patent: 6642531 (2003-11-01), Powers

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