Electrostatic particle removal and characterization

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...

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15 151, 436177, 324459, 324464, A47L 1340

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active

055849385

ABSTRACT:
An electrostatic decontamination method and decontamination device (10) is disclosed for decontaminating the surface of a semiconductor substrate. The decontamination device (10) includes particle ionizing device (24) that charges contaminating particles (26) on the surface of semiconductor substrate (16) thereby creating ionized particles. Decontamination device (10) also includes substrate biasing device (12) for creating a charge accumulation layer (14) at the top of semiconductor substrate (16) so that the charge accumulation layer (14) has the same charge sign as the ionized particles. In addition, the invention analytically characterizes particles using contaminating particle isolator (44) which contains a particle ionizing device (24) that charges contaminating particles (26) on the surface of semiconductor substrate (16) thereby creating ionized particles. Contaminating particle isolator (44) includes substrate biasing device (12) operable to create charge accumulation layer (14) at the top of semiconductor substrate (16) so that the charge accumulation layer (14) has the same charge sign as the ionized particles. Contaminating particle isolator (44) also includes particle collector (46) that collects the ionized particles. This permits characterizing the particles to determine their chemical composition.

REFERENCES:
patent: 4812662 (1989-03-01), Croto et al.
patent: 5024968 (1991-06-01), Engelsberg
patent: 5099557 (1992-03-01), Engelsberg
patent: 5125124 (1992-06-01), Saeki et al.
patent: 5187635 (1993-02-01), Yehl
"Breakthrough Cleaning Process Ready for Licensing", Betty Newboe, Semiconductor International, May 1993, p. 36.
D. W. Cooper, H.L. Wolfe, and R. J. Miller, "Electrostatic Removal of Particles From Surfaces", Particles on Surfaces 1, book, edited by K. L. Mittal, Plenum Press, New York & London, 1988.
Dan A. Hays, "Electric Field Detachment of Charged Particles", Particles on Surfaces 1, book, edited by K. L. Mittal, Plenum Press, New York & London, 1988.
Robert Kaiser, "Enhanced Removal of Sub-Micron Particles From Surfaces By High Molecular Weight Fluorocarbon Surfactant Solutions", Particles on Surfaces 2, book, edited by K. L. Mittal, Plenum Press, New York & London, 1989.

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