Electrostatic gas cleaning process and apparatus

Gas separation: processes – Electric or electrostatic field – And nonelectrical separation of fluid mixture

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55222, 55269, 95 67, 95 71, 96 27, 96 53, 96 55, 96 74, B03C 316

Patent

active

052828859

ABSTRACT:
In the purification of gases generated in metallurgical and similar furnace operations, the impurities include solid particles and compounds or elements which are gaseous at the furnace temperatures and only form solid or liquid at temperatures approaching ambient conditions. Proper cleaning therefore requires cooling of the gases to at least the water dew point to cause these impurities to form as particles or droplets. This invention describes a process and apparatus for collecting such particles or droplets in which a charging device and condensation equipment are combined to provide a simple, yet effective apparatus at a fraction of the cost of conventional apparatus.

REFERENCES:
patent: 2002704 (1935-05-01), Miller
patent: 2209798 (1940-07-01), Subkow
patent: 2431236 (1947-11-01), Fleming et al.
patent: 2675891 (1954-04-01), Frey
patent: 2855292 (1958-10-01), Vogt
patent: 3633337 (1972-01-01), Walker et al.
patent: 3830039 (1974-08-01), Ebert et al.
patent: 3874858 (1975-04-01), Klugman et al.
patent: 3958958 (1976-05-01), Klugman et al.
patent: 4750916 (1988-06-01), Svensson
patent: 4778493 (1988-10-01), Fitch et al.

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