Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1988-05-31
1990-07-17
Cintins, Ivars
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
55124, 55131, 55137, 55139, 210243, B01D 1500, B01D 3506, B03C 300
Patent
active
049419625
ABSTRACT:
An electrostatic adsorptive fluid filtering apparatus wherein an adsorbent provided in a flow path of fluid to be treated has adsorption capacity as well as adsorption power substantially improved as a result of enhancement of a potential inherently carried by the adsorbent on its adsorptive hole surface by impressing a DC or DC/AC voltage onto a charging electrode provided with the adsorbent or by placing the adsorbent in an electric field. The apparatus includes an outer cylindrical electrode, a charging electrode within the outer cylindrical electrode, a central electrode, the adsorbent and a source of the electrical voltage connected to the outer cylindrical electrode, the charging electrode and the central electrode. The DC or DC/AC voltage is impressed across the outer cylindrical electrode and the charge electrode, on one side, with the voltage on the charging electrode and the outer cylindrical electrode being at the same potential while fluid under pressure is introduced through an inlet in the outer cylindrical electrode to a fluid receiving space defined by the outer cylindrical electrode and the charging electrode.
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Cintins Ivars
Inoue Noboru
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