Electroplating chamber with rotatable wafer holder and pre-wetti

Details Electroplating chamber with rotatable wafer holder and pre-wetti Electroplating chamber with rotatable wafer holder and pre-wetti

1998-06-10

2000-08-08

Gorgos, Kathryn

Chemistry: electrical and wave energy

Apparatus

Electrolytic

118 52, 118400, 118500, 204224R, 204225, 204237, 204275, C25D 1706, C25D 2108

Patent

active

060997028

ABSTRACT:
A plating cell has an inner plating bath container for performing electroplating on a work piece (e.g., a wafer) submerged in a solution contained by the inner plating bath container. A reclaim inlet funnels any solution overflowing the inner plating bath container back into a reservoir container to be circulated back into the inner plating bath container. A waste channel is also provided having an inlet at a different height than the inlet of the reclaim channel. After electroplating, the wafer is lifted to a position and spun. While spinning, the wafer is thoroughly rinse with, for example, ultra pure water. The spin rate and height of the wafer determine whether the water and solution are reclaimed through the reclaim channel or disposed through the waste channel.

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