Electroplating apparatus with self-cleaning contacts

Details Electroplating apparatus with self-cleaning contacts Electroplating apparatus with self-cleaning contacts

1998-10-28

2000-06-27

Valentine, Donald R.

Chemistry: electrical and wave energy

Apparatus

Electrolytic

204275, 204279, 204297R, 204297W, C25B 900, C25D 1704

Patent

active

060802898

ABSTRACT:
An electroplating apparatus comprising a plating tank containing electroplating solution, one or more substrates to be electroplated, and an electrical contact mechanism. The electrical contact mechanism comprises a first set of one or more conductive contacts electrically connected to a power supply and a second set of one or more conductive contacts mounted to a substrate carrier. The second set of contacts wipes against the first set of contacts when the carrier is maneuvered into and out of a plating position. At least one of the first and second sets of contacts is spring-biased. The first set of contacts may comprise one or more inverted-L-shaped, pivotable contacts, each mounted within a notch in a contact block.

REFERENCES:
patent: 4781813 (1988-11-01), Archer et al.
patent: 4844779 (1989-07-01), Callahan
patent: 5456814 (1995-10-01), Metzka
patent: 5904820 (1999-05-01), Brown et al.

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