Electrophotography with uniform exposure for residual potential

Details Electrophotography with uniform exposure for residual potential Electrophotography with uniform exposure for residual potential

1978-10-17

1980-10-21

Martin, Jr., Roland E.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Charging simultaneous with imaging

430 31, 430126, 430 58, G03G 1322, G03G 514

Patent

active

042295114

ABSTRACT:
The present invention provides an electrophotographic process for producing copied images by repeating the respective steps of at least charging a layered photoconductor having a carrier generation layer and a carrier transport layer, in that order, on a light-transmissible electroconductive support, effecting image-wise exposure by way of one side of said layered photoconductor and developing subsequent thereto, in which the occurrence of stains on the ground of the image is minimized by uniformly applying light in an amount of exposure sufficient for substantially eliminating the residual potential resulting from said image-wise exposure by way of the other side of the layered photoconductor either simultaneously with the image-wise exposure or in the course of from the image-wise exposure to the development.

REFERENCES:
patent: 3337339 (1967-08-01), Snelling
patent: 3655369 (1972-04-01), Kinoshita
patent: 3776627 (1973-12-01), Ohnishi et al.
patent: 3873310 (1975-03-01), Bean
patent: 4047945 (1977-09-01), Pfister et al.
patent: 4071361 (1978-01-01), Marushima

Affiliated with

Also associated with

Rating

Electrophotography with uniform exposure for residual potential does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electrophotography with uniform exposure for residual potential, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrophotography with uniform exposure for residual potential will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2023362