Electrophotographic recording material and method for the manufa

Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Radiation-sensitive composition or product

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430 66, 430128, 430132, G03G 5085

Patent

active

051088606

ABSTRACT:
An electrophotographic recording material is applied on a plate-shaped or drum-shaped substrate in a layer structure of superposed layers which comprises a photoconductive layer and at least the uppermost layer is fashioned of amorphous, hydrogen-containing carbon. The amorphous, hydrogen-containing carbon layer is deposited from a radio frequency excited low-pressure plasma with gaseous hydrocarbon as a reaction gas and in which a self-bias DC voltage is superimposed on the radio frequency field. The a-c:H material obtained in this manner is semiconducting and has photoconductive properties so that it can be employed for the photoconductive layer of the electrophotographic recording material.

REFERENCES:
patent: 4868076 (1989-09-01), Iino et al.
patent: 4886724 (1989-12-01), Masaki et al.
patent: 4898798 (1990-02-01), Sugata et al.
patent: 4950571 (1990-08-01), Hotomi et al.
Heywang, W., "Amorphe und polykvistalline Halbleiter", 1984, Springer-Verlag, Berlin, Heidelberg, New York, Tokyo, pp. 40-48.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Electrophotographic recording material and method for the manufa does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electrophotographic recording material and method for the manufa, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrophotographic recording material and method for the manufa will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1248500

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.