Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Radiation-sensitive composition or product
Patent
1987-06-22
1988-11-01
Martin, Roland E.
Radiation imagery chemistry: process, composition, or product th
Electric or magnetic imagery, e.g., xerography,...
Radiation-sensitive composition or product
430 64, 430 49, 430131, G03G 514, G03G 1328
Patent
active
047820004
ABSTRACT:
An electrophotographic recording element consisting of an aluminum base, which is mechanically, chemically and/or electrochemically pretreated in a conventional manner, and a photoconductive layer which is applied to this base is produced by a process in which a thin layer which imparts hydrophilic properties and consists of a hydrolysis product or condensate of a silane is applied between the base and the photoconductive layer.
These recording elements are particularly useful for electrophotographic offset printing.
REFERENCES:
patent: 3276868 (1966-10-01), Uhlig
patent: 3440050 (1969-04-01), Chu
patent: 3902976 (1975-09-01), Walls
patent: 3907562 (1975-09-01), Crystal
patent: 4063948 (1977-12-01), Lind
patent: 4066453 (1978-01-01), Lind et al.
patent: 4153461 (1979-05-01), Berghauser et al.
patent: 4405702 (1983-09-01), Shirai et al.
patent: 4439509 (1984-03-01), Sclank
patent: 4464450 (1984-08-01), Teuscler
patent: 4571371 (1986-02-01), Yashiki
Lieng-Huang Lee, "Adhesive Chemistry", vol. 29, pp. 139-163.
Lauke Harald
Leyrer Reinhold J.
Loerzer Thomas
Nick Bernhard
BASF - Aktiengesellschaft
Martin Roland E.
LandOfFree
Electrophotographic recording elements with hydrolyzed silane la does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electrophotographic recording elements with hydrolyzed silane la, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrophotographic recording elements with hydrolyzed silane la will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-890508