Electrophotographic photosensitive member

Details Electrophotographic photosensitive member Electrophotographic photosensitive member

2006-01-31

2006-01-31

Goodrow, John L (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

C430S056000, C430S095000

Reexamination Certificate

active

06991879

ABSTRACT:
In an electrophotographic photosensitive member comprising a conductive substrate, and provided thereon a photoconductive layer containing at least an amorphous material composed chiefly of silicon atoms and, deposited on the photoconductive layer, a layer region containing an amorphous material composed chiefly of silicon atoms, which layer region contains at least partly a periodic-table Group 13 element, the content of the periodic-table Group 13 element based on the total amount of constituent atoms in the layer region deposited on the photoconductive layer has distribution having at least any two of maximum value(s) and maximum region(s) in the thickness direction of the layer region. This electrophotographic photosensitive member can be improved in charging performance, can prevent image defects due to pressure mars and can form high-quality images over a long period of time.

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Curtins, et al.; “Influence of Plasma Excitation Frequency for a-Si:H Thin Film Deposition”; Plasma Chemistry and Plasma Processing, vol. 7, No. 3, 1987, 267-273.

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