Electrophotographic photosensitive material having thin amorphou

Details Electrophotographic photosensitive material having thin amorphou Electrophotographic photosensitive material having thin amorphou

1982-04-26

1984-02-07

Welsh, John D.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

430 66, 430 67, 430961, G03G 514

Patent

active

044304048

ABSTRACT:
An electrophotographic photosensitive material having a long lifetime can be provided by forming an amorphous silicon layer having a thickness of 0.01-0.08 .mu.m on the photoconductive layer on the electrically conductive substrate in the said material without changing the characteristics of the photoconductive layer.

REFERENCES:
patent: 3904406 (1975-09-01), Takahashi
patent: 4084986 (1978-04-01), Aoki et al.
patent: 4225222 (1980-09-01), Kempter

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