Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Radiation-sensitive composition or product
Patent
1991-01-29
1992-08-04
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Electric or magnetic imagery, e.g., xerography,...
Radiation-sensitive composition or product
430127, G03G 5087
Patent
active
051358301
ABSTRACT:
An electrophotographic light-sensitive material comprising a support having provided thereon at least one photoconductive layer containing an inorganic photoconductive substance and a binder resin, wherein the binder resin comprises (A) at least one resin (resin (A)) having a weight average molecular weight of from 1.times.10.sup.3 to 2.times.10.sup.4 and containing not less than 30% by weight of a polymer component corresponding to a repeating unit represented by the general formula (I) described below, and having at least one specified acidic group bonded to one of the terminals of the main chain thereof: ##STR1## wherein a.sub.1, a.sub.2 and R.sub.1 are as defined in the specification; and (B) at least one graft type copolymer (resin (B)) having a weight average molecular weight of from 3.times.10.sup.4 to 1.times.10.sup.6 and formed from, as a copolymerizable component, at least one mono-functional macromonomer (M) having a weight average molecular weight of from 1.times.10.sup.3 to 2.times.10.sup.4 and comprising an AB block copolymer being composed of an A block comprising at least one polymer component containing at least one specified acidic group, and a B block containing at least one polymer component represented by the general formula (II) described below and having a polymerizable double bond group bonded to the terminal of the main chain of the B block polymer: ##STR2## wherein b.sub.1, b.sub.2, X.sub.1 and R.sub.21 are as defined in the specification.
The electrophotographic light-sensitive material exhibits excellent electrostatic characteristics and mechanical strength even under severe conditions. Also, it is advantageously employed in the scanning exposure system using a semiconductor laser beam.
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Fuji Photo Film Co. , Ltd.
McCamish Marion E.
RoDee C. D.
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