Electrophotographic light-sensitive material

Details Electrophotographic light-sensitive material Electrophotographic light-sensitive material

1984-07-03

1985-12-17

Martin, Roland E.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

430 57, 430 67, G03G 1504

Patent

active

045592896

ABSTRACT:
An electrophotographic light-sensitive material is described, comprising an electrically conductive support, an amorphous silicon photoconductive layer on the support, and a layer of amorphous material containing at least carbon and halogen atoms is provided on the photoconductive layer. This material is free from a serious reduction in resolving power as is encountered in conventional electrophotographic light-sensitive materials when they are exposed to corona discharge, particularly negative corona discharge under high temperature/humidity conditions.

REFERENCES:
patent: 4361638 (1982-11-01), Higashi et al.
patent: 4394425 (1983-07-01), Shimizu et al.
patent: 4452875 (1984-06-01), Ogawa et al.
patent: 4465750 (1984-08-01), Ogawa et al.
patent: 4483911 (1984-11-01), Ogawa et al.
patent: 4510224 (1985-04-01), Yamazaki et al.

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