Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Radiation-sensitive composition or product
Patent
1978-01-26
1981-10-06
Talbert, Jr., Bennie E.
Radiation imagery chemistry: process, composition, or product th
Electric or magnetic imagery, e.g., xerography,...
Radiation-sensitive composition or product
430 72, 430 79, 260174, G03G 506
Patent
active
042936284
ABSTRACT:
The present invention provides disazo compounds expressed by the general formula ##STR1## [wherein A represents ##STR2## (wherein R represents alkyl radical, alkoxy radical, nitro radical, dialkylamino radical or halogen, n is 0 or an integer ranging from 1 to 3, and R may be identical or different when n is an integer of 2 or 3)]; a process for the preparation of said compounds; and photosensitive materials having a high sensitivity as well as a high flexibility which comprises a conductive support and a photosensitive layer formed thereon, said photosensitive layer containing a disazo pigment, as an effective ingredient, which is expressed by the general formula ##STR3## [wherein R' represents a member selected from the group consisting of hydrogen, ethyl radical, chloroethyl radical and hydroxyethyl radical, A' represents a member selected from the group consisting of ##STR4## (wherein X represents a member selected from the group consisting of aromatic rings such as benzene ring, naphthalene ring, etc., heterocyclic rings such as indole ring, carbazole ring, benzofuran ring, etc. and their substituents, Ar.sub.1 represents a member selected from the group consisting of aromatic rings such as benzene ring, naphthalene ring, etc., heterocyclic rings such as dibenzofuran ring, etc. and their substituents, Ar.sub.2 and Ar.sub.3 represent respectively a member selected from the group consisting of aromatic rings such as benzene ring, naphthalene ring, etc. and their substituents, R.sub.1 and R.sub.3 represent respectively a member selected from the group consisting of hydrogen, lower alkyl radical or phenyl radical and their substituents, and R.sub.2 represents a member selected from the group consisting of lower alkyl radical, carboxyl radical and their esters)].
REFERENCES:
patent: 3775105 (1973-11-01), Kukla
patent: 3837851 (1974-09-01), Shattuck et al.
patent: 3871882 (1975-03-01), Wiedemann
patent: 4018607 (1977-04-01), Contois
patent: 4026704 (1977-05-01), Rochlitz
Schlosser, "A New Organic Double-Layer System and Its Photoconduction Mechanism," J. Appl. Photo Eng., 4, 118, 1978.
Hashimoto Mitsuru
Kozima Akio
Ohta Masafumi
Sakai Kiyoshi
Sasaki Masaomi
Goodrow John L.
Ricoh Co. Ltd.
Talbert, Jr. Bennie E.
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